CORPORATE HISTORY

2018
Change Name to “ABLIC Inc.”

2017
High-efficiency SWRs
2016
Established ABLIC Inc.
2016
Medical device ICs
2015
High-power dissipation packages (TO-252-5S)
2015
Wireless power ICs
2014
Timer ICs for automotive use
2013
Magnetism sensor ICs for automotive use
2011
Ultra-small 0.8 x 0.8 mm packages (HSNT)
2009
High-power dissipation packages (HSOP-6)
2009
Power supply ICs for automotive use
2005
Ultra-low voltage operation charge pumps
2003
Ultra-small packages (SNT)
2003
EEPROM for automotive use
1999
Lithium-ion battery protection ICs (Secondary protection)
1996
Began the post process at the Akita plant.
1993
Lithium-ion battery protection ICs / EEPROM
1990
Real-time clock ICs
1987
Completed the 6-inch line for the wafer process.
1986
Non-volatile memories
1985
Temperature sensor ICs
1984
Magnetism sensor ICs
1983
Voltage regulators and voltage detectors
1979
Completed the 4-inch line for the wafer process.
1979
Analog quartz ICs
1970
Completed the 2-inch line for development.
1968
Began CMOS IC R&D.
1937
Established 1937 Daini Seikosha Co., Ltd. (the present-day Seiko Instruments Inc.)
1881
Established K. Hattori (the present-day Seiko Holdings Corporation)
    2017 High-efficiency SWRs
Established SII Semiconductor Corporation 2016 2016 Medical device ICs
High-power dissipation packages (TO-252-5S) 2015 2015 Wireless power ICs
    2014 Timer ICs for automotive use
    2013 Magnetism sensor ICs for automotive use
Ultra-small 0.8 x 0.8 mm packages (HSNT) 2011    
High-power dissipation packages (HSOP-6) 2009 2009 Power supply ICs for automotive use
    2005 Ultra-low voltage operation charge pumps
Ultra-small packages (SNT) 2003 2003 EEPROM for automotive use
    1999 Lithium-ion battery protection ICs (Secondary protection)
Began the post process at the Akita plant. 1996    
    1993 Lithium-ion battery protection ICs / EEPROM
    1990 Real-time clock ICs
Completed the 6-inch line for the wafer process. 1987    
    1986 Non-volatile memories
    1985 Temperature sensor ICs
    1984 Magnetism sensor ICs
    1983 Voltage regulators and voltage detectors
Completed the 4-inch line for the wafer process. 1979 1979 Analog quartz ICs
Completed the 2-inch line for development. 1970    
Began CMOS IC R&D. 1968    
Established 1937 Daini Seikosha Co., Ltd.
(the present-day Seiko Instruments Inc.)
1937    
Established K. Hattori
(the present-day Seiko Holdings Corporation)
1881